Mg-doped AlGaN grown on an AlN/sapphire template by metalorganic chemical vapour deposition

نویسندگان

  • Hongbo Yu
  • Wlodek Strupinski
  • Serkan Butun
  • Ekmel Ozbay
چکیده

The growth of high-performance Mg-doped p-type Al x Ga1–xN (x = 0.35) layers using low-pressure metalorganic chemical vapour deposition on an AlN/sapphire template is reported. The influence of growth conditions on the p-type conductivity of the Al x Ga1–xN (x = 0.35) alloy was investigated. It was found that the p-type resistivity of the AlGaN alloy demonstrates a marked dependence on the Mg concentration, V/III ratio and group III element flow rate. A minimum p-type resistivity of 3.5 Ω cm for Al x Ga1–xN (x = 0.35) epilayers was achieved. A Ni/Au (10 nm/100 nm) ohmic contact was also fabricated and a specific contact resistivity of 8.1 × 10 Ω cm was measured.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Structural, morphological, and optical properties of AlGaN/GaN heterostructures with AlN buffer and interlayer

AlxGa1−xN/GaN x 0.3 heterostructures with and without a high-temperature HT AlN interlayer IL have been grown on sapphire Al2O3 substrates and AlN buffer/Al2O3 templates by metal organic chemical vapor deposition. The effects of an AlN buffer layer BL grown on an Al2O3 substrate and an AlN IL grown under the AlGaN ternary layer TL on structural, morphological, and optical properties of the hete...

متن کامل

Migration Enhanced Metalorganic Chemical Vapor Deposition of AlN/GaN/InN based heterostructures

We applied a new Migration Enhanced Metalorganic Chemical Vapor Deposition (MEMOCVD) epitaxial technique for growing AlN/GaN/InN epitaxial films and heterostructure layers on 2”, 3” and 4” substrates. The growth of the AlN/GaN/InN layers was carried out using controlled precursor pulsed flows to achieve accurate thickness control over large area substrates. This technique bridges the gap betwee...

متن کامل

Determination of two-dimensional electron and hole gas carriers in AlGaN/GaN/AlN heterostructures grown by Metal Organic Chemical Vapor Deposition

Resistivity and Hall effect measurements on nominally undoped Al0.25Ga0.75N/GaN/AlN heterostructures grown on sapphire substrates prepared by metal organic chemical vapor deposition have been carried out as a function of temperature (20–300 K) and magnetic field (0–1.4 T). Variable magnetic field Hall data have been analyzed using the improved quantitative mobility spectrum analysis technique. ...

متن کامل

MOCVD growth and electrical studies of p-type AlGaN with Al fraction 0.35

We present a study on the high performance p-type AlxGa1 xN (x 1⁄4 0:35) layers grown by low-pressure metalorganic chemical vapor deposition on AlN template/sapphire substrate. The influence of growth conditions on the p-type conductivity of the AlxGa1 xN (x 1⁄4 0:35) alloy is investigated. From the Hall effect and I–V transmission line model measurements, a p-type resistivity of 3.5O cm for Al...

متن کامل

Synthesis and optical characterization of erbium-doped III-N double heterostructures

We report on the first successful synthesis of Er-doped III-N double heterostructures (DHs) grown on sapphire substrates. AlGaN layers, with an Al concentration of ∼12%, were prepared by metalorganic chemical vapor deposition and Er-doped GaN layers by molecular beam epitaxy. The Er concentration was estimated to be ∼1018 cm−3. GaN:Er/AlGaN single heterostructures (SHs) and AlGaN/GaN:Er/AlGaN D...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2006